Chia-Yi, Taiwan

Kai-Lin Chuang

USPTO Granted Patents = 11 

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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11 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Kai-Lin Chuang

Introduction

Kai-Lin Chuang, an innovative inventor based in Chia-Yi, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of 10 patents to his name, Chuang is a well-respected figure in the industry, recognized for his groundbreaking work on semiconductor devices and process detection apparatuses.

Latest Patents

Chuang's latest patents showcase his expertise and innovative approach. One prominent patent is for a "Semiconductor device structure including stacked nanostructures." This invention provides a semiconductor device structure that features a plurality of first nanostructures stacked vertically over a substrate. It also includes a first bottom layer adjacent to the stacked nanostructures, along with a first dielectric liner layer and a first source/drain structure. This configuration enhances the performance and reliability of semiconductor devices.

Another notable patent is for an "In-situ apparatus for detecting abnormality in process tube." This patent introduces a device capable of detecting external materials within a fluid flowing through a process tube. Using both direct measurement with a light-detecting sensor and indirect measurement based on the Doppler shift principle, the apparatus effectively monitors for any anomalies during semiconductor manufacturing, minimizing the need for separate inspection devices.

Career Highlights

Chuang's career has been marked by his dedication to advancements in semiconductor technologies. Working at Taiwan Semiconductor Manufacturing Company Limited (TSMC), he has been at the forefront of innovation within the semiconductor industry. His contributions have not only advanced the technology but have also reinforced the importance of precision and efficiency in semiconductor fabrication.

Collaborations

Chuang's innovative journey has been enriched by collaboration with esteemed colleagues such as Jun Xiu Liu and Chung-Pin Chou. These partnerships have fostered an environment of creativity and shared expertise, enabling the development of cutting-edge technologies that continue to influence the industry.

Conclusion

Kai-Lin Chuang’s work exemplifies the spirit of innovation within the semiconductor field. His patents reflect a commitment to improving device structures and processes, contributing to the evolution of technology in meaningful ways. As he continues to push the boundaries of what is possible in semiconductor design, Chuang remains a pivotal figure in the world of inventions and technological advancements.

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