Taipei, Taiwan

Kai-Hsiang Chang

This inventor holds 42 USPTO granted patents, primarily in Semiconductor Connectors. Top assignees: Cheng Uei Precision Industry Co., Ltd., Taiwan Semiconductor Manufacturing Comp. Ltd., Wistron Corporation. Active years: 2006-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kai-Hsiang Chang. Retrieved from https://idiyas.com/inventor/kai-hsiang-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 47.6

Average Co-Inventor Count = 2.8

ph-index = 9

Forward Citations = 232(Granted Patents)


Location History:

  • Taipei Hsien, TW (2008)
  • Tu-Cheng, CN (2011)
  • Tu-Cheng, TW (2006 - 2012)
  • Taichung, TW (2014 - 2018)
  • New Taipei, TW (2012 - 2021)

Company Filing History:


Years Active: 2006-2021

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Areas of Expertise:
Semiconductor Device
Wafer Inspection
Electrical Connector
Waterproof Connector
Receptacle Connector
Card Connector
Audio Jack Connector
USB Connector
Modular Jack Connector
Power Source Control
Connector Assembly
Display Device
42 patents (USPTO):Explore Patents

Title: Innovations by Kai-Hsiang Chang: A Focus on Semiconductor Advancements

Introduction: Kai-Hsiang Chang is a prominent inventor based in New Taipei, Taiwan. With a remarkable portfolio of 42 patents, he has significantly contributed to the field of semiconductor technology. His innovations are pivotal for various processes used in the fabrication and inspection of semiconductor devices.

Latest Patents: Among his latest patents, one notable invention is the "Apparatus and Method for Inspecting a Wafer Process Chamber." This invention includes a sensor, a processor, and a lifetime predictor. The sensor captures crucial information about hardware parts of the wafer process chamber, allowing the processor to determine their conditions. The lifetime predictor then estimates the remaining useful life of these parts based on the identified conditions. Another cutting-edge patent by Chang is the "Apparatus and Method for Fabricating a Semiconductor Device." This design features a reaction chamber with a gas inlet and a gas distribution plate that facilitates uniform gas flow by varying the open ratios within its concentric regions, enhancing the efficiency of semiconductor fabrication processes.

Career Highlights: Throughout his career, Kai-Hsiang Chang has made significant strides in the semiconductor industry. He has held positions at reputable companies such as Cheng Uei Precision Industry Co., Ltd. and Taiwan Semiconductor Manufacturing Company Limited, further establishing his expertise in the field.

Collaborations: Collaborating with talented individuals further enhances Chang's contributions to the industry. Notable coworkers include Chao-Yong Ye and Kuo-Chin Lin, with whom he has worked closely on various innovative projects.

Conclusion: Kai-Hsiang Chang's dedication to advancing semiconductor technology is evident through his numerous patents and collaborations. His work not only reflects his ingenuity but also contributes to the ongoing evolution of semiconductor manufacturing processes, impacting the technology landscape significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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