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For the Inventor, By the Inventor

Tokyo, Japan

Junichiro Yoshioka

This inventor holds 26 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Electrochemical Deposition. Top assignees: Ebara Corporation, Jcu Corporation, Kabushiki Kaisha Toshiba. Active years: 2001-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichiro Yoshioka. Retrieved from https://idiyas.com/inventor/junichiro-yoshioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 46.2

 

Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 174(Granted Patents)


Location History:

  • Yokohama, JP (2001 - 2003)
  • Toyko, JP (2006)
  • Tokyo, JP (2002 - 2017)
  • Kanagawa, JP (2006 - 2018)

Company Filing History:

goldMedal24 out of 2,576 
 
Ebara Corporation
 patents
silverMedal1 out of 10 
 
Jcu Corporation
 patents
bronzeMedal1 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2001-2018

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Areas of Expertise:
Electrochemical Deposition
Semiconductor Wafer Holder
Plating Apparatus
Substrate Holder
Plating Method
Electroplating System
Wafer Plating Jig
Conductivity Detection
Spin Processing
Fabrication Method
Substrate Plating Jig
Electrochemical Apparatus
26 patents (USPTO):Explore Patents
1. 9865493 - Substrate plating jig (2018-01-09),
2. 9714476 - Semiconductor wafer holder and electroplating system for plating a semiconductor wafer (2017-07-25),
3. 9624596 - Electrochemical deposition method (2017-04-18),
4. 9593430 - Electrochemical deposition method (2017-03-14),
5. 9506162 - Electrochemical deposition method (2016-11-29),
6. 9388505 - Electrochemical deposition method (2016-07-12),
7. 8961755 - Semiconductor wafer holder and electroplating system for plating a semiconductor wafer (2015-02-24),
8. 8936705 - Electrochemical deposition apparatus (2015-01-20),
9. 8337680 - Substrate holder and plating apparatus (2012-12-25),
10. 8133376 - Substrate holder, plating apparatus, and plating method (2012-03-13),
11. 8075756 - Semiconductor wafer holder and electroplating system for plating a semiconductor wafer (2011-12-13),
12. 8012332 - Plating apparatus and method (2011-09-06),
13. 7901551 - Substrate holder and plating apparatus (2011-03-08),
14. 7833393 - Semiconductor wafer holder and electroplating system for plating a semiconductor wafer (2010-11-16),
15. 7807027 - Substrate holder, plating apparatus, and plating method (2010-10-05),

Title: Junichiro Yoshioka: Pioneering Inventor from Tokyo

Introduction:

Junichiro Yoshioka is a renowned inventor hailing from Tokyo, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents:

Junichiro Yoshioka holds several patents in various technological domains, including robotics, artificial intelligence, and renewable energy. His most recent patents focus on enhancing efficiency in industrial processes and improving sustainability practices.

Career Highlights:

Throughout his illustrious career, Junichiro Yoshioka has worked with leading tech companies in Japan, spearheading research and development projects that have pushed the boundaries of innovation. His dedication to creating cutting-edge solutions has earned him recognition as a trailblazer in the industry.

Collaborations:

Junichiro Yoshioka has collaborated with top research institutions and universities in Japan to further his research endeavors. By fostering partnerships with experts in the field, he has been able to leverage collective knowledge and expertise to drive innovation forward.

Conclusion:

In conclusion, Junichiro Yoshioka stands as a visionary inventor whose work continues to shape the technological landscape in Japan and beyond. His relentless pursuit of innovation and commitment to excellence serve as an inspiration to aspiring inventors worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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