Junichiro Matsunaga

Title: Junichiro Matsunaga: Innovator in Substrate Processing Technologies

Introduction

Junichiro Matsunaga is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative techniques have advanced the efficiency and uniformity of substrate processing methods.

Latest Patents

Matsunaga's latest patents include a substrate processing method and a substrate processing apparatus. The first patent describes a method that involves supplying a processing gas containing a halogen-containing gas and a basic gas to a substrate, which has a silicon film formed on it. This method generates a reaction product by deforming the surface of the silicon film and subsequently removes the reaction product by adjusting the substrate's temperature. The second patent focuses on a technique for achieving uniform etching amounts in selectively etching SiGe layers on a wafer. This process involves the simultaneous supply of ClF gas and HF gas to ensure consistent etching rates across the SiGe layers.

Career Highlights

Junichiro Matsunaga is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced substrate processing technologies that enhance the performance of semiconductor devices.

Collaborations

Matsunaga has collaborated with notable coworkers, including Nobuhiro Takahashi and Masashi Matsumoto. Their combined expertise has contributed to the successful development of innovative substrate processing techniques.

Conclusion

Junichiro Matsunaga's contributions to substrate processing technologies have established him as a key figure in the field. His patents reflect a commitment to innovation and excellence in semiconductor manufacturing.