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For the Inventor, By the Inventor

Taipei, Taiwan

Jui-Hsiung Liu

This inventor holds 6 USPTO granted patents and 4 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., National Tsing Hua University, Tsinghua University. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jui-Hsiung Liu. Retrieved from https://idiyas.com/inventor/jui-hsiung-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 100.0

Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Taipei, TW (2019 - 2023)
  • Hsinchu, TW (2023)

Company Filing History:

goldMedal5 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal2 out of 1,308 
 
National Tsing Hua University
 patents
bronzeMedal2 out of 3,148 
 
Tsinghua University
 patents
where one patent can have more than one assignee

Years Active: 2019-2026

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6 patents (USPTO):Explore Patents
1. 12765331 - Photoresist and formation method thereof (2026-10-13),
2. 12607929 - Photoresist and formation method thereof (2026-04-21),
3. 12517427 - Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography (2026-01-06),
4. 11767336 - Organometallic cluster photoresists for EUV lithography (2023-09-26),
5. 11579531 - Organometallic cluster photoresists for EUV lithography (2023-02-14),
6. 10522361 - Atomic layer deposition method (2019-12-31),

Title: Innovations of Jui-Hsiung Liu

Introduction

Jui-Hsiung Liu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of organometallic cluster photoresists for extreme ultraviolet (EUV) lithography processes. With a total of 6 patents, Liu's work is recognized for its innovative approach to enhancing lithographic techniques.

Latest Patents

Liu's latest patents focus on organotin cluster compounds, which are essential for photoresists used in EUV lithography. The present disclosure details the formula (I) of these compounds and their application in advanced lithographic processes. This innovation aims to improve the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Throughout his career, Jui-Hsiung Liu has worked with prominent organizations, including Taiwan Semiconductor Manufacturing Company Ltd. and Tsinghua University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.

Collaborations

Liu has collaborated with several notable individuals, including Hsu-Kai Chang and Chi-Ming Yang. These partnerships have fostered a rich environment for innovation and development in the field of photolithography.

Conclusion

Jui-Hsiung Liu's contributions to the field of EUV lithography through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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