The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2023
Filed:
Sep. 25, 2019
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Hsu-Kai Chang, Hsinchu, TW;
Chi-Ming Yang, Hsinchu, TW;
Jui-Hsiung Liu, Taipei, TW;
Jui-Hung Fu, Kaohsiung, TW;
Hsin-Yi Wu, Taichung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/36 (2006.01); G03F 7/004 (2006.01); C07F 7/22 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/30 (2013.01); C07F 7/2224 (2013.01); G03F 7/0042 (2013.01); G03F 7/36 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01);
Abstract
The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
Chang, Hsu-Kai. (2023). Organometallic cluster photoresists for euv lithography (U.S. Patent No. 11579531). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11579531
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile