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For the Inventor, By the Inventor

Seoul, South Korea

Ju-Eun Kim

USPTO Granted Patents = 8 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 26(Granted Patents)


Location History:

  • Seoul, KR (2013 - 2016)
  • Hwaseong-si, KR (2015 - 2023)

Company Filing History:

goldMedal8 out of 131,766 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2013-2023

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8 patents (USPTO):Explore Patents
1. 11837621 - Image sensor including a semiconductor pattern (2023-12-05),
2. 11462577 - Image device and fabricating method thereof (2022-10-04),
3. 9466612 - Semiconductor memory devices and methods of forming the same (2016-10-11),
4. 9257441 - Semiconductor memory devices and methods of forming the same (2016-02-09),
5. 9054037 - Method of fabricating semiconductor device (2015-06-09),
6. 8980731 - Methods of forming a semiconductor device (2015-03-17),
7. 8592873 - Semiconductor memory devices and methods of forming the same (2013-11-26),
8. 8445343 - Methods of fabricating semiconductor devices including semiconductor layers formed in stacked insulating layers (2013-05-21),

Title: Ju-Eun Kim: Pioneering Inventor from Seoul

Introduction: Ju-Eun Kim is a renowned inventor hailing from Seoul, South Korea, known for his groundbreaking contributions to various technological fields.

Latest Patents: Ju-Eun Kim holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Ju-Eun Kim has worked with leading research institutions and tech companies, consistently pushing the boundaries of innovation. His work has been instrumental in shaping the future of technology.

Collaborations: Throughout his career, Ju-Eun Kim has collaborated with top scientists, engineers, and researchers from around the globe, fostering a culture of innovation and knowledge exchange.

Conclusion: Ju-Eun Kim's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and researchers worldwide.

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