Company Filing History:

8 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

4 out of 255

Siliconix Incorporated

patents

4 out of 749

Alpha & Omega Semiconductor Corporation

patents

4. 1 out of 1,264

Integrated Device Technology, Inc.

patents

Years Active: 1994-2020

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17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10644118 - Self-aligned contact for trench power MOSFET (2020-05-05),

2. 10424654 - Power device with high aspect ratio trench contacts and submicron pitches between trenches (2019-09-24),

3. 10020380 - Power device with high aspect ratio trench contacts and submicron pitches between trenches (2018-07-10),

4. 9691863 - Self-aligned contact for trench power MOSFET (2017-06-27),

5. 6479881 - Low temperature process for forming intermetal gap-filling insulating layers in silicon wafer integrated circuitry (2002-11-12),

6. 6395635 - Reduction of tungsten damascene residue (2002-05-28),

7. 6291872 - Three-dimensional type inductor for mixed mode radio frequency device (2001-09-18),

8. 6291331 - Re-deposition high compressive stress PECVD oxide film after IMD CMP process to solve more than 5 metal stack via process IMD crack issue (2001-09-18),

9. 6281146 - Plasma enhanced chemical vapor deposition (PECVD) method for forming microelectronic layer with enhanced film thickness uniformity (2001-08-28),

10. 6268274 - Low temperature process for forming inter-metal gap-filling insulating layers in silicon wafer integrated circuitry (2001-07-31),

11. 6099662 - Process for cleaning a semiconductor substrate after chemical-mechanical (2000-08-08),

12. 5956609 - Method for reducing stress and improving step-coverage of tungsten (1999-09-21),

13. 5904525 - Fabrication of high-density trench DMOS using sidewall spacers (1999-05-18),

14. 5767578 - Surface mount and flip chip technology with diamond film passivation for (1998-06-16),

15. 5757081 - Surface mount and flip chip technology for total integrated circuit (1998-05-26),

Title: Jowei Dun: Innovator in Semiconductor Technology

Introduction

Jowei Dun is a prominent inventor based in San Jose, CA, known for his significant contributions to semiconductor technology. With a total of 17 patents to his name, Dun has made remarkable advancements in the field, particularly in power MOSFET devices.

Latest Patents

Among his latest patents is the invention of a self-aligned contact for trench power MOSFET. This device features a layer of nitride over the conductive material in the gate trenches, enhancing the performance of the MOSFET. Another notable patent is for a power device with high aspect ratio trench contacts and submicron pitches between trenches. This invention includes a semiconductor power device with a plurality of gate trenches formed in the active cell area, which improves the efficiency and functionality of semiconductor devices.

Career Highlights

Dun has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company and Siliconix Incorporated. His experience in these organizations has allowed him to develop innovative solutions that address the challenges faced in semiconductor manufacturing.

Collaborations

Throughout his career, Jowei Dun has collaborated with notable professionals in the field, including Ying-Lang Wang and Fwu-Iuan Hshieh. These collaborations have contributed to the advancement of semiconductor technologies and the successful development of his patents.

Conclusion

Jowei Dun's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of efficient and advanced semiconductor devices.

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