This inventor holds 13 USPTO granted patents and 5 published patent applications, primarily in Semiconductor Etching. Top assignees: Lam Research Corporation, Novellus Systems Incorporated. Active years: 2014-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2022
Areas of Expertise:
Title: The Innovative Contributions of Joon Hong Park
Introduction
Joon Hong Park is a prominent inventor based in Dublin, California, known for his significant contributions to the field of substrate processing technology. With a total of 13 patents to his name, Park has made remarkable advancements that have influenced the development of FinFET devices and selective etching methods.
Latest Patents
Among his latest patents is the "Ultrahigh selective nitride etch to form FinFET devices." This innovative substrate processing system features an upper chamber region, an inductive coil, and a lower chamber region that supports a substrate. The system includes a gas distribution device with a plate containing multiple holes, a cooling plenum, and a purge gas plenum. The design allows for selective etching of a substrate layer relative to other exposed layers, showcasing Park's expertise in plasma processing technology. Another notable patent is focused on "Systems and methods for selectively etching film," which outlines a method for selectively etching one exposed material of a substrate while adjusting various parameters during the plasma processing.
Career Highlights
Joon Hong Park has had a distinguished career, working with leading companies in the semiconductor industry. He has been associated with Lam Research Corporation and Novellus Systems Incorporated, where he has contributed to the advancement of substrate processing technologies. His work has been instrumental in enhancing the efficiency and effectiveness of etching processes used in semiconductor manufacturing.
Collaborations
Throughout his career, Park has collaborated with notable professionals in the field, including Dengliang Yang and Ivelin A Angelov. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in substrate processing.
Conclusion
Joon Hong Park's contributions to the field of substrate processing and his innovative patents have significantly impacted the semiconductor industry. His work continues to inspire advancements in technology and showcases the importance of innovation in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile