John Charles Petrus

Title: Innovations of John Charles Petrus

Introduction

John Charles Petrus is a notable inventor based in Stanfordville, NY (US). He has made significant contributions to the field of technology, particularly through his innovative patents. With a total of four patents to his name, Petrus has demonstrated a commitment to advancing engineering and semiconductor technologies.

Latest Patents

Petrus's latest patents include a method for stress relaxation and selective nitride phase removal. This method involves forming a dielectric cap layer over an interconnect layer created by a back-end-of-the-line (BEOL) interconnect process. The process includes lithography, reactive ion etching (RIE), metal filling of BEOL conductors, and chemical-mechanical polishing (CMP). A sacrificial material is positioned between the conductors of the interconnect layer, and the dielectric cap layer is made porous through an oxidation process. Another significant patent is for a planar pedestal multi-gate device. This method describes forming a transistor by disposing a planar platform of silicon atop a support structure of oxide, which is on a substrate. The process includes forming gate structures both atop and beneath the planar platform, as well as creating source and drain diffusions within the platform.

Career Highlights

Petrus is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop cutting-edge technologies that have a lasting impact on the industry.

Collaborations

Throughout his career, Petrus has collaborated with esteemed colleagues such as Terence Lawrence Kane and Chung-Ping Eng. These collaborations have contributed to the advancement of his projects and innovations.

Conclusion

John Charles Petrus is a distinguished inventor whose work has significantly influenced the field of technology. His innovative patents and collaborations reflect his dedication to engineering excellence.