The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Jun. 26, 2003
Applicants:
Wei LU, Poughkeepsie, NY (US);
John Charles Petrus, Standfordville, NY (US);
Inventors:
Wei Lu, Poughkeepsie, NY (US);
John Charles Petrus, Standfordville, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N023/225 ;
U.S. Cl.
CPC ...
Abstract
A metrology process for increasing image contrast of a buried feature, comprising milling a selected surface of a substrate to expose a cross section of the buried feature; exposing the exposed cross section with a gas mixture, wherein the gas mixture comprises a flourine bearing compound; and irradiating the exposed cross section with a high energy beam to increase image contrast of the buried feature.