Austin, TX, United States of America

Joel Estrella

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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8 patents (USPTO):

Title: The Innovative Journey of Joel Estrella in Bath Processing Technologies

Introduction

Joel Estrella, an accomplished inventor based in Austin, TX, is renowned for his contributions to the field of bath processing technologies. With a total of seven patents to his name, his innovative work is paving the way for advancements in substrate processing.

Latest Patents

One of Joel's most recent patents describes a sophisticated method for processing a plurality of substrates within a bath system. This innovative approach involves immersing substrates into a bath solution contained in a bath chamber, generating gas bubbles in the solution, and projecting light toward the bath chamber. A unique aspect of this patent is the generation of light sensor data by capturing light that emanates from the bath chamber after interacting with gas bubbles. This data is then converted into a metric for the bath solution, providing critical insights for users and enhancing processing capabilities.

Career Highlights

Joel Estrella is currently employed at Tokyo Electron Limited, where he applies his expertise to develop cutting-edge solutions in the semiconductor manufacturing sector. His dedication and ingenuity have not only led to multiple patents but have also significantly impacted the efficiency and effectiveness of bath processing techniques.

Collaborations

Throughout his career, Joel has collaborated with talented individuals such as Joshua Hooge and Michael Carcasi. Working together, they form a dynamic team that fosters innovation and drives advancements within the industry.

Conclusion

In conclusion, Joel Estrella's journey as an inventor exemplifies the spirit of innovation in the field of bath processing technologies. His patents and collaborative efforts demonstrate a commitment to advancing substrate processing methods, making him a notable figure in the industry. With his ongoing contributions, the future looks promising for innovations in this domain.

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