San Jose, CA, United States of America

Jingmei Liang

USPTO Granted Patents = 38 

Average Co-Inventor Count = 3.8

ph-index = 11

Forward Citations = 1,767(Granted Patents)


Location History:

  • Mountain View, CA (US) (2010)
  • San Jose, CA (US) (2011 - 2024)
  • Santa Clara, CA (US) (2023 - 2024)

Company Filing History:


Years Active: 2010-2025

where 'Filed Patents' based on already Granted Patents

38 patents (USPTO):

Title: **Jingmei Liang: Innovating in Silicon Nitride and Plasma Treatments**

Introduction

Jingmei Liang is a prominent innovator based in San Jose, California, with an impressive portfolio of 36 patents to his name. His groundbreaking work primarily focuses on advancements in the treatment of silicon nitride-based dielectric films and plasma treatment processes, significantly contributing to the field of microelectronics.

Latest Patents

Jingmei Liang's latest patents showcase innovative methods for enhancing semiconductor technology. One of his significant patents involves methods of post-treating silicon nitride-based dielectric films using helium-containing high-energy low-dose plasma. This technique aims to improve the properties of silicon nitride films by optimizing energy levels and ion flux density during the treatment process.

In addition, Jingmei has developed a plasma treatment process designed for film densification on microelectronic devices. This method includes forming an oxide layer and subjecting it to a carefully controlled plasma treatment sequence, resulting in a densified oxide layer with significantly reduced etch rates, thereby enhancing device performance.

Career Highlights

Currently, Jingmei Liang is making strides at Applied Materials, Inc., a global leader in materials engineering solutions used to produce advanced semiconductor devices. His work has not only advanced the company's technological capabilities but has also pushed the boundaries of semiconductor manufacturing.

Collaborations

Jingmei has collaborated with notable colleagues in the field, including Nitin K Ingle and Praket Prakash Jha, to drive innovation and find solutions to complex challenges in semiconductor processing. Their combined expertise acts as a catalyst for developing new technologies and methods that can be applied across various applications in the electronics industry.

Conclusion

Jingmei Liang stands out as an influential inventor whose work significantly impacts the semiconductor industry. With a strong portfolio of patents and ongoing collaborations, he continues to drive innovation at Applied Materials, Inc., ensuring advancements in microelectronic technologies that are vital for future developments.

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