The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Oct. 19, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Suketu Arun Parikh, San Jose, CA (US);
Martin Jay Seamons, San Jose, CA (US);
Jingmei Liang, San Jose, CA (US);
Shuchi Sunil Ojha, Redwood City, CA (US);
Tom Choi, Sunnyvale, CA (US);
Nitin K. Ingle, San Jose, CA (US);
Sanjay Natarajan, Portland, OR (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate processing method includes creating a mask on a top surface of a workpiece. A first portion of a gap fill material is overlaid by the mask and a second portion of the gap fill material is exposed through an opening in the mask. The method further includes exposing the workpiece to a plasma. The method further includes performing a first etching of the first portion of the gap fill material to create a first cavity while the second portion of the gap fill material remains in place, depositing a first metal-containing substance in the first cavity, performing a second etching of the second portion of the gap fill material to create a second cavity while the first metal-containing substance remains in place, and depositing a second metal-containing substance in the second cavity.