The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Jan. 12, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jung Chan Lee, Sunnyvale, CA (US);
Praket P. Jha, San Jose, CA (US);
Jingmei Liang, San Jose, CA (US);
Jinrui Guo, Santa Clara, CA (US);
Wenhui Li, Jilin, CN;
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); H01L 21/0217 (2013.01); H01L 21/02164 (2013.01); H01L 21/31116 (2013.01);
Abstract
A method of depositing a silicon-containing material is disclosed. Some embodiments of the disclosure provide films which fill narrow CD features without a seam or void. Some embodiments of the disclosure provide films which form conformally on features with wider CD. Embodiments of the disclosure also provide superior quality films with low roughness, low defects and advantageously low deposition rates.