This inventor holds 36 USPTO granted patents and 14 published patent applications, primarily in CVD Film Technology. Top assignee: Applied Materials, Inc.. Active years: 2016-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016-2026
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Title: Innovations by Praket Prakash Jha: A Leader in Microelectronics Patents
Introduction: Praket Prakash Jha is a distinguished inventor based in San Jose, California, known for his substantial contributions to the field of microelectronics. With a remarkable portfolio of 30 patents, he has pioneered innovative methods that advance semiconductor technology and enhance device performance.
Latest Patents: Among Praket Jha's latest patents are two notable innovations. The first is a method for post-treating silicon nitride-based dielectric films using high-energy low-dose plasma. This method involves positioning a substrate with a silicon nitride film in a processing chamber and exposing it to helium-containing plasma. The energy of the helium ions ranges from 1 eV to 3.01 eV, and the flux density varies between 5×10 ions/cm·sec and 1.37×10 ions/cm·sec, optimizing the dielectric film's properties.
The second patent presents a plasma treatment process for densifying oxide layers on microelectronic devices. This method describes the formation of a silicon oxide-containing oxide layer followed by a two-step plasma treatment process. The first plasma treatment employs a first RF source to generate plasma directed by a DC bias, and the treated oxide layer is subsequently exposed to a second plasma treatment without a bias, resulting in a densified oxide layer with a final wet etch rate significantly lower than the initial rate.
Career Highlights: Praket Jha is currently affiliated with Applied Materials, Inc., a leading company in semiconductor manufacturing equipment. His extensive experience and innovative methodologies significantly contribute to the company's advancements in microelectronic technologies.
Collaborations: Throughout his career, Praket has collaborated with esteemed colleagues Jingmei Liang and Bok Hoen Kim, together fostering a culture of innovation and excellence in their work within the semiconductor industry.
Conclusion: Praket Prakash Jha’s significant contributions through his patents reflect his dedication to pushing the boundaries of microelectronics. His work not only exemplifies technological advancement but also positions him as a key influencer in the industry, paving the way for future innovations in semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile