Cupertino, CA, United States of America

Jeong Soo Byun

This inventor holds 49 USPTO granted patents and 3 published patent applications, primarily in Nonvolatile Memory Fabrication. Top assignees: Applied Materials, Inc., Cypress Semiconductor Corporation, On Semiconductor Trading, Ltd.. Active years: 2003-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeong Soo Byun. Retrieved from https://idiyas.com/inventor/jeong-soo-byun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 49 

% Patents Active = 57.1

Average Co-Inventor Count = 3.2

ph-index = 24

Forward Citations = 2,541(Granted Patents)


Company Filing History:


Years Active: 2003-2020

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Areas of Expertise:
Nonvolatile Memory
Charge Trap Memory
Atomic Layer Deposition
Plasma Oxidation
Oxide Formation
Tungsten Deposition
Image Sensor
Strain Engineering
Composite Films
Barrier Layers
Vapor Deposition
Refractory Metals
49 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Jeong Soo Byun in Nonvolatile Charge Trap Memory Devices

Introduction

Jeong Soo Byun is an accomplished inventor based in Cupertino, CA, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 49 patents, Byun has been at the forefront of innovations that enhance the functionality of nonvolatile memory devices.

Latest Patents

Among Byun’s latest patents are innovative methods for fabricating nonvolatile charge trap memory devices. One notable method involves a radical oxidation process where a substrate undergoes a first oxidation procedure to create a tunnel oxide layer over a polysilicon channel. Following this, a multi-layer charge storing layer is formed, consisting of an oxygen-rich first layer and an oxygen-lean second layer, both comprising nitrides. The second oxidation process is crucial, utilizing either a plasma oxidation technique or a radical oxidation process that employs In-Situ Steam Generation to optimize performance. Another patent details a memory transistor design, where a multi-layer charge storage layer is strategically employed beneath a blocking structure created by plasma oxidation. This configuration results in a unique charge storage capability, optimizing memory functionality and efficiency.

Career Highlights

Jeong Soo Byun has made significant strides throughout his career, having worked with leading companies in the semiconductor industry such as Applied Materials, Inc. and Cypress Semiconductor Corporation. His work has not only pushed the boundaries of memory device technology but has also led to practical applications in various consumer electronics.

Collaborations

Throughout his career, Byun has collaborated with talented individuals in the field, including Alfred W Mak and Hua Chung. These partnerships have facilitated the exchange of ideas and fostered innovations that contribute significantly to advancements in semiconductor technology.

Conclusion

With a strong background and numerous patents to his name, Jeong Soo Byun continues to be a pivotal figure in the evolution of memory technology. His innovative approaches and collaborative spirit reflect his dedication to enhancing the efficiency and reliability of nonvolatile charge trap memory devices. Byun’s work not only propels his career forward but also significantly contributes to the broader field of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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