logo

For the Inventor, By the Inventor

Portland, OR, United States of America

Jeffrey Blackwood

This inventor holds 24 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in TEM Sample Preparation. Top assignees: Fei Comapny, Lsi Logic Corporation, Lsi Corporation. Active years: 2004-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeffrey Blackwood. Retrieved from https://idiyas.com/inventor/jeffrey-blackwood

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 91.7

 

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 169(Granted Patents)


Company Filing History:

goldMedal21 out of 860 
 
Fei Comapny
 patents
silverMedal2 out of 3,715 
 
Lsi Logic Corporation
 patents
bronzeMedal1 out of 2,353 
 
Lsi Corporation
 patents

Years Active: 2004-2022

Loading Chart...
Loading Chart...
Areas of Expertise:
Fiducial Design
Charged Particle Beam
Automated Preparation
Gas-Assisted Etching
High Aspect Ratio Structures
Plan-View Lamellae
Curtaining Reduction
Thin Samples
Photoemission Analysis
Micro-Probing Platform
Chip CAD Layout
24 patents (USPTO):Explore Patents
1. 11315756 - Fiducial design for tilted or glancing mill operations with a charged particle beam (2022-04-26),
2. 11062879 - Face-on, gas-assisted etching for plan-view lamellae preparation (2021-07-13),
3. 10825651 - Automated TEM sample preparation (2020-11-03),
4. 10546719 - Face-on, gas-assisted etching for plan-view lamellae preparation (2020-01-28),
5. 10340119 - Automated TEM sample preparation (2019-07-02),
6. 10026590 - Fiducial design for tilted or glancing mill operations with a charged particle beam (2018-07-17),
7. 9741536 - High aspect ratio structure analysis (2017-08-22),
8. 9696372 - Multidimensional structural access (2017-07-04),
9. 9601313 - Automated TEM sample preparation (2017-03-21),
10. 9488554 - Method and system for reducing curtaining in charged particle beam sample preparation (2016-11-08),
11. 9412560 - Bulk deposition for tilted mill protection (2016-08-09),
12. 9384982 - Depositing material into high aspect ratio structures (2016-07-05),
13. 9378925 - TEM sample preparation (2016-06-28),
14. 9336985 - Method for creating S/TEM sample and sample structure (2016-05-10),
15. 9279752 - Method for preparing thin samples for TEM imaging (2016-03-08),

Title: Innovator Spotlight: Jeffrey Blackwood

Introduction:

Jeffrey Blackwood, a talented inventor based in Portland, OR, has made significant contributions to the field of nanotechnology with his 24 patents and groundbreaking research. Let's delve into his latest patents, career highlights, and notable collaborations in the industry.

Latest Patents:

1. Fiducial design for tilted or glancing mill operations with a charged particle beam: Jeffrey's innovative method allows for the precise analysis of samples through charged particle beam technology, resulting in the creation of three-dimensional models of features of interest within nanoscale structures.

2. Face-on, gas-assisted etching for plan-view lamellae preparation: His method for preparing plan-view lamellae from microelectronic devices showcases his expertise in utilizing focused ion beams with etch-assisting gases to expose underlying layers accurately.

Career Highlights:

Jeffrey Blackwood has left a significant mark in the industry with his tenure at Fei Company and LSI Logic Corporation. His innovative approaches to nanoscale technology have garnered recognition and praise from peers and professionals alike.

Collaborations:

Throughout his career, Jeffrey has collaborated with esteemed professionals like Stacey Stone and Michael Schmidt. Together, they have pushed the boundaries of nanotechnology and unlocked new possibilities in the field.

Conclusion:

Inventor Jeffrey Blackwood's dedication to innovation and his groundbreaking patents highlight his commitment to advancing nanotechnology. His contributions continue to inspire and set new standards in the industry, making him a true trailblazer in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…