The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Oct. 04, 2013
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Sang Hoon Lee, Hillsboro, OR (US);
Stacey Stone, Portland, OR (US);
Jeffrey Blackwood, Portland, OR (US);
Michael Schmidt, Gresham, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
G01R 23/02 (2006.01); H01J 37/305 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01); C23C 14/46 (2006.01); G01N 1/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3053 (2013.01); C23C 14/46 (2013.01); H01J 37/28 (2013.01); H01J 37/3056 (2013.01); H01J 37/3178 (2013.01); G01N 1/32 (2013.01); H01J 2237/3174 (2013.01); H01J 2237/31745 (2013.01); H01J 2237/31749 (2013.01);
Abstract
Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.