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For the Inventor, By the Inventor

Otis Orchards, WA, United States of America

Janine K Kardokus

This inventor holds 16 USPTO granted patents and 1 EPO patent. Top assignees: Honeywell International Inc., Johnson Matthey Electronics, Inc., Cymer, Inc.. Active years: 1996-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Janine K Kardokus. Retrieved from https://idiyas.com/inventor/janine-k-kardokus

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16

% Patents Active = 93.8

 

Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 205(Granted Patents)


Location History:

  • Otis Orchards, WA (US) (1996 - 2005)
  • Veradale, WA (US) (2011 - 2016)

Company Filing History:

goldMedal9 out of 16,049 
 
Honeywell International Inc.
 patents
silverMedal6 out of 19 
 
Johnson Matthey Electronics, Inc.
 patents
bronzeMedal1 out of 542 
 
Cymer, Inc.
 patents

Years Active: 1996-2016

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16 patents (USPTO):Explore Patents
1. 9279178 - Manufacturing design and processing methods and apparatus for sputtering targets (2016-03-08),
2. 9246298 - Corrosion resistant electrodes for laser chambers (2016-01-26),
3. 8030082 - Liquid-particle analysis of metal materials (2011-10-04),
4. 6858102 - Copper-containing sputtering targets, and methods of forming copper-containing sputtering targets (2005-02-22),
5. 6849139 - Methods of forming copper-containing sputtering targets (2005-02-01),
6. 6645427 - Copper sputtering target assembly and method of making same (2003-11-11),
7. 6555250 - Ni-plated target diffusion bonded to a backing plate and method of making same (2003-04-29),
8. 6451185 - Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same (2002-09-17),
9. 6331234 - Copper sputtering target assembly and method of making same (2001-12-18),
10. 6274015 - Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same (2001-08-14),
11. 6113761 - Copper sputtering target assembly and method of making same (2000-09-05),
12. 5863398 - Hot pressed and sintered sputtering target assemblies and method for (1999-01-26),
13. 5809393 - Sputtering target with ultra-fine, oriented grains and method of making (1998-09-15),
14. 5803342 - Method of making high purity copper sputtering targets (1998-09-08),
15. 5780755 - Sputtering target with ultra-fine, oriented grains and method of making (1998-07-14),

Title: Janine K Kardokus: A Trailblazer in Innovation

Introduction:

Janine K Kardokus, a visionary inventor hailing from Otis Orchards, WA, is a driving force in the world of innovation. With a remarkable 16 patents to his name, Janine is shaping the future and inspiring upcoming inventors to think beyond conventional boundaries.

Latest Patents:

Among his latest creations is the development of manufacturing design and processing methods for sputtering targets. These innovative targets boast a reduced burn-in time, featuring a heat-modified surface material with a uniform crystallographic orientation. Additionally, his patents include corrosion-resistant electrodes for laser chambers, crafted from phosphorus-doped brass to withstand plasma corrosion effectively.

Career Highlights:

Janine K Kardokus has left an indelible mark on esteemed companies such as Honeywell International Inc. and Johnson Matthey Electronics, Inc., where his expertise has been instrumental in advancing cutting-edge technologies. His dedication to pioneering solutions has garnered recognition and admiration throughout the industry.

Collaborations:

Throughout his career, Janine has collaborated with esteemed colleagues such as Chi Tse Wu and Christopher L Parfeniuk. Together, they have collectively driven innovation and brought forth groundbreaking inventions that have revolutionized their respective fields.

Conclusion:

In conclusion, Janine K Kardokus continues to epitomize the spirit of innovation, challenging norms and pushing boundaries to create a more progressive future. His relentless pursuit of excellence serves as a beacon for aspiring inventors, inspiring them to dream big and revolutionize the world through their inventive endeavors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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