The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
May. 12, 1999
Ritesh P. Shah, Liberty Lake, WA (US);
David E. Steele, Spokane, WA (US);
William R. Turner, Spokane, WA (US);
Anthony F. Beier, Spokane, WA (US);
Janine K. Kardokus, Otis Orchards, WA (US);
Susan D. Strothers, Spokane, WA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
The invention includes a method of forming a heat treated sputtering target assembly. A backing plate is diffusion bonded to a sputtering target to produce a sputtering target assembly. The sputtering target assembly is heat treated to precipitation harden the backing plate of the assembly. The heat treatment includes heating and quenching, with the quenching being performed by immersing the backing plate in a quenchant without submerging the sputtering target.