Anthony F Beier

Title: **Innovative Contributions of Anthony F. Beier in Sputtering Target Technology**

Introduction

Anthony F. Beier, an accomplished inventor based in Spokane, WA, has made significant strides in the field of materials science, particularly through his innovative patents in sputtering target assemblies. With a total of three patents under his name, Beier has demonstrated a commitment to advancing technology in his industry.

Latest Patents

Beier's most notable inventions include:

1. **Ni-plated target diffusion bonded to a backing plate and method of making same**

This invention outlines a method of forming a heat-treated sputtering target assembly. It involves diffusion bonding a backing plate to a sputtering target, followed by a heat treatment process that precipitates hardens the backing plate. The unique quenching method utilizes immersion in a quenchant without fully submerging the sputtering target, enhancing the assembly's performance.

2. **Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same**

This patent describes a method for producing a diffusion bonded sputtering target assembly that undergoes thermal treatment to precipitate harden the backing plate while preserving the integrity of the diffusion bond. The innovative process includes quenching by partial immersion in a quenchant after diffusion bonding, allowing for various tempers in the backing plate material.

Career Highlights

Anthony F. Beier currently works at Honeywell International Inc., where his expertise in material engineering has been pivotal in developing cutting-edge technologies. His work not only enhances the company's portfolio but also contributes to advancements in the fields of electronics and material science.

Collaborations

Throughout his career, Beier has collaborated with talented colleagues such as Janine K. Kardokus and Susan D. Strothers, fostering a collaborative environment that encourages innovation and creativity. These partnerships enable the sharing of ideas and enhance the overall impact of their research and development efforts.

Conclusion

Anthony F. Beier's inventive spirit and dedication to developing advanced sputtering target technologies have positioned him as a key figure in his field. His contributions not only reflect his ingenuity but also highlight the importance of teamwork and collaboration in driving technological innovations. With a strong foundation of patents and a commitment to excellence, Beier continues to push the boundaries of what's possible in material science.