Jang-Gyoo Yang

This inventor holds 25 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 2011-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jang-Gyoo Yang. Retrieved from https://idiyas.com/inventor/jang-gyoo-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 (Patent Applications = 2)

% Patents Active = 84.0

Average Co-Inventor Count = 5.4

ph-index = 15

Forward Citations = 2,151(Granted Patents)

Company Filing History:

25 out of 14,454

Applied Materials, Inc.

patents

Years Active: 2011-2025

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Areas of Expertise:

Gas Distribution

CVD Chambers

Chemical Control

Plasma Source

Wafer Processing

Temperature Control

Batch Curing

Dry-Etch Selectivity

Capacitively Coupled Plasma

RF Plasma Source

Inert Gas Excitation

Remote Plasma Source

25 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12203171 - Batch curing chamber with gas distribution and individual pumping (2025-01-21),

2. 12146219 - Flow control features of CVD chambers (2024-11-19),

3. 11408075 - Batch curing chamber with gas distribution and individual pumping (2022-08-09),

4. 11264213 - Chemical control features in wafer process equipment (2022-03-01),

5. 10550472 - Flow control features of CVD chambers (2020-02-04),

6. 10354843 - Chemical control features in wafer process equipment (2019-07-16),

7. 10283321 - Semiconductor processing system and methods using capacitively coupled plasma (2019-05-07),

8. 10113236 - Batch curing chamber with gas distribution and individual pumping (2018-10-30),

9. 10062587 - Pedestal with multi-zone temperature control and multiple purge capabilities (2018-08-28),

10. 10056233 - RPS assisted RF plasma source for semiconductor processing (2018-08-21),

11. 10032606 - Semiconductor processing with DC assisted RF power for improved control (2018-07-24),

12. 9978564 - Chemical control features in wafer process equipment (2018-05-22),

13. 9741545 - RPS assisted RF plasma source for semiconductor processing (2017-08-22),

14. 9502218 - RPS assisted RF plasma source for semiconductor processing (2016-11-22),

15. 9384997 - Dry-etch selectivity (2016-07-05),

Title: Jang-Gyoo Yang: Innovator in Semiconductor Technology

Introduction

Jang-Gyoo Yang, based in San Jose, California, is a prominent inventor in the semiconductor industry. With an impressive portfolio of 25 patents, Yang has significantly contributed to advancements in processing technologies. His work focuses on optimizing production chambers and improving gas distribution systems used in semiconductor manufacturing.

Latest Patents

Among Yang's latest innovations is the "Batch Curing Chamber with Gas Distribution and Individual Pumping." This invention relates to a batch processing chamber designed to simultaneously cure multiple substrates, featuring independently temperature-controlled processing sub-regions. Additionally, his patent addressing "Flow Control Features of CVD Chambers" outlines a gas distribution assembly that enhances the efficiency of gas flow in chemical vapor deposition (CVD) processes. Both patents exemplify Yang's commitment to enhancing the performance and efficiency of semiconductor fabrication.

Career Highlights

Jang-Gyoo Yang currently plays a pivotal role at Applied Materials, Inc., a leading company in the semiconductor equipment and services sector. His extensive experience and innovative mindset have earned him recognition in the industry, propelling forward the capabilities of modern semiconductor manufacturing.

Collaborations

Throughout his career, Yang has collaborated with talented professionals, including notable coworkers Xinglong Chen and Shankar Venkataraman. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Jang-Gyoo Yang stands out as a remarkable inventor whose contributions continue to shape the landscape of semiconductor technology. With an impressive number of patents and a strong professional background, Yang exemplifies the spirit of innovation that drives the industry forward.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

2 patents pending: