The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Jan. 15, 2016
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Xinglong Chen, San Jose, CA (US);

Jang-Gyoo Yang, San Jose, CA (US);

Alexander Tam, Union City, CA (US);

Elisha Tam, Saratoga, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23Q 3/00 (2006.01); H01L 21/67 (2006.01); F28D 15/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67103 (2013.01); F28D 15/00 (2013.01); H01L 21/67109 (2013.01);
Abstract

Substrate support assemblies for a semiconductor processing apparatus are described. The assemblies may include a pedestal and a stem coupled with the pedestal. The pedestal may be configured to provide multiple regions having independently controlled temperatures. Each region may include a fluid channel to provide a substantially uniform temperature control within the region, by circulating a temperature controlled fluid that is received from and delivered to internal channels in the stem. The fluid channels may include multiple portions configured in a parallel-reverse flow arrangement. The pedestal may also include fluid purge channels that may be configured to provide thermal isolation between the regions of the pedestal.


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