Location History:
- Menlo Park, CA (US) (2003)
- San Jose, CA (US) (2004)
- San Francisco, CA (US) (2010 - 2023)
Company Filing History:
Years Active: 2003-2023
Title: Innovations and Contributions of Jan A Lauber
Introduction
Jan A Lauber is a prominent inventor based in San Jose, California, known for his significant contributions to the field of optical inspection and defect measurement. With a total of 13 patents to his name, Lauber has made remarkable advancements in utilizing deep learning methods for defect size measurement and correlating optical images with scanning electron microscopy images.
Latest Patents
One of Lauber's latest patents is focused on defect size measurement using deep learning methods. This innovative system employs detectors configured to receive a beam of light reflected from a wafer. For instance, three detectors may be utilized, each serving as a different channel. The images captured by these detectors are combined into a pseudo-color RGB image. A convolutional neural network unit (CNN) processes this pseudo-color RGB image to determine the size of a defect and classify it into a size category. Another notable patent is the method and system for correlating optical images with scanning electron microscopy images. This process involves acquiring a full optical image of a sample, identifying a feature-of-interest, and correlating the optical image with an SEM image based on the presence of the feature and a reference structure.
Career Highlights
Throughout his career, Jan A Lauber has worked with notable companies such as KLA-Tencor Corporation and KLA Corporation. His work has significantly impacted the field of semiconductor manufacturing and inspection technologies.
Collaborations
Lauber has collaborated with several professionals in his field, including Yong Zhang and Mark Armstrong McCord. These collaborations have contributed to the advancement of technologies in optical inspection and defect measurement.
Conclusion
Jan A Lauber's innovative work and patents have greatly influenced the field of optical inspection and defect measurement. His contributions continue to pave the way for advancements in semiconductor technology and deep learning applications.
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