James Michael Mori

Title: Discovering the Innovations of James Michael Mori

Introduction

James Michael Mori is an accomplished inventor based in Boston, MA, with a remarkable portfolio of 9 patents to his name. His work primarily focuses on advancements in photoresist compositions, significantly impacting the field of lithography and material science.

Latest Patents

Among his latest contributions to the industry are two pioneering patents. The first, titled "Photoresist compositions and methods and articles of manufacture comprising same," reveals positive-acting chemically-amplified photoresist compositions designed to offer excellent lithographic performance while significantly enhancing storage stability. This invention introduces a unique formulation that includes a solvent free of hydroxy groups, alongside a resin binder and a photoactive compound that showcases enhanced solubility.

The second patent, "Dyed photoresists and methods and articles of manufacture comprising same," presents innovative photoresist compositions that incorporate a resin binder, a photoactive component (specifically an acid generator), and a dye material with chromophores capable of mitigating unwanted reflections during exposure. The preferred dye compounds comprise polymeric materials with chromophores like anthracene, effectively absorbing deep UV exposure radiation.

Career Highlights

Throughout his career, James has worked with esteemed companies such as Shipley Company, LLC and Rohm & Haas Electronic Materials LLC. His expertise in the field has allowed him to contribute significantly to advancements in photoresist technologies, solidifying his reputation as a leading innovator.

Collaborations

In addition to his individual accomplishments, James has collaborated with notable professionals in the industry, including James W. Thackeray and Roger F. Sinta. These partnerships have fostered the exchange of ideas and helped propel innovation within the field of electronic materials.

Conclusion

James Michael Mori’s contributions through his patents and collaborations exemplify his commitment to advancing technology in the realm of photoresist compositions. His innovative inventions continue to influence various applications, demonstrating the importance of research and collaboration in driving progress within scientific and engineering communities.