The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Aug. 04, 1998
James F. Cameron, Boston, MA (US);
James Michael Mori, Boston, MA (US);
George W. Orsula, Harvard, MA (US);
Guangyu Xu, Northboro, MA (US);
Yoshihiro Yamamoto, Niigata, JP;
James F. Cameron, Boston, MA (US);
James Michael Mori, Boston, MA (US);
George W. Orsula, Harvard, MA (US);
Guangyu Xu, Northboro, MA (US);
Yoshihiro Yamamoto, Niigata, JP;
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.