Avon, MA, United States of America

George W Orsula


Average Co-Inventor Count = 2.7

ph-index = 11

Forward Citations = 362(Granted Patents)


Location History:

  • Tewksbury, MA (US) (1992 - 1996)
  • Avon, MA (US) (1998 - 2010)
  • Harvard, MA (US) (1999 - 2010)

Company Filing History:


Years Active: 1992-2010

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21 patents (USPTO):

Title: The Innovative Contributions of George W. Orsula

Introduction

George W. Orsula, an inventive force hailing from Avon, MA, has made significant contributions to the field of photoresist compositions through his innovative work and numerous patents. With a remarkable portfolio of 21 patents, Orsula's inventions have paved the way for advancements in lithographic processes used in various industries.

Latest Patents

Among her latest patents, two notable inventions stand out. The first is an invention related to antihalation compositions, which focus on reducing the reflection of exposure radiation on photoresist layers. This composition comprises a resin binder and materials that enable a thermally induced crosslinking reaction. The second patent involves positive-acting chemically-amplified photoresist compositions that exhibit excellent lithographic performance and storage stability. This invention features a solvent devoid of hydroxy groups, alongside a resin binder and a photoactive compound, ensuring enhanced longevity and effectiveness of the photoresist.

Career Highlights

Throughout her career, Orsula has worked with significant organizations, notably the Shipley Company, LLC. Her work at this company has been characterized by innovative approaches to develop and enhance photoresist technologies that are crucial for modern manufacturing processes.

Collaborations

In her journey as an inventor, Orsula has collaborated with esteemed coworkers such as James W. Thackeray and Roger F. Sinta. These collaborations have further enriched her work and have been instrumental in the development of various patents that contribute to the field.

Conclusion

George W. Orsula's inventive spirit and dedication have led to noteworthy advancements in photoresist technology, influencing various applications in the industry. Her extensive list of patents showcases her commitment to innovation, making her a significant figure in the world of inventions. The impact of her work continues to resonate, highlighting the importance of creativity in technological advancement.

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