Shipley Company LLC

Other

International Business Machines Corporation

Rohm & Haas Electronic Materials LLC

Shiply Company Inc.

Shipley Company, L.l.c. of Marlborough

George W Orsula

James W Thackeray

Roger F Sinta

James F Cameron

James Michael Mori

Mark D Denison

Wu-Song S Huang

Sheri L Ablaza

Wayne Martin Moreau

Hiroshi Ito

Mahmoud M Khojasteh

Kuang-Jung Chen

Ahmad D Katnani

William R Brunsvold

Ronald Wayne Nunes

Ronald Anthony DellaGuardia

Yoshihiro Yamamoto

Uday Kumar

Guangyu Xu

James I Fahey

Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Antihalation compositions

The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.

Photoresist compositions and methods and articles of manufacture comprising same

The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.

Photoresist compositions comprising blends of photoacid generators

The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.

Photoresist comprising blends of photoacid generators

Methods are provided to prepare photoresists without isolation of various components, i.e. in a 'one-pot' procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.

Methods for preparing photoresist compositions

Method comprising substrates coated with an antihalation layer that

Substrates coated with an antihalation layer that contains a resin

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Avon, MA, United States of America

George W Orsula