The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 1999
Filed:
Oct. 30, 1997
Roger F Sinta, Woburn, MA (US);
Uday Kumar, Natick, MA (US);
George W Orsula, Harvard, MA (US);
James I Fahey, Mendon, MA (US);
William R Brunsvold, Poughkeepsie, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ahmad D Katnani, Poughkeepsie, NY (US);
Ronald W Nunes, Hopewell Junction, NY (US);
Mahmoud M Khojasteh, Poughkeepsie, NY (US);
IBM Corporation of Armonk, New York, NY (US);
Shipley Company, L.L.C. of Marlborough, Marlborough, MA (US);
Abstract
Methods are provided to prepare photoresists without isolation of various components, i.e. in a 'one-pot' procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.