The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Oct. 07, 1996
James Michael Mori, Dorchester, MA (US);
James W. Thackeray, Braintree, MA (US);
Roger F. Sinta, Woburn, MA (US);
Rosemary Bell, Wayland, MA (US);
Robin L. Miller-fahey, Marlborough, MA (US);
Timothy G. Adams, Sudbury, MA (US);
Thomas M. Zydowsky, Cambridge, MA (US);
Edward K. Pavelchek, Stow, MA (US);
Manuel Docanto, Stoughton, MA (US);
James Michael Mori, Dorchester, MA (US);
James W. Thackeray, Braintree, MA (US);
Roger F. Sinta, Woburn, MA (US);
Rosemary Bell, Wayland, MA (US);
Robin L. Miller-Fahey, Marlborough, MA (US);
Timothy G. Adams, Sudbury, MA (US);
Thomas M. Zydowsky, Cambridge, MA (US);
Edward K. Pavelchek, Stow, MA (US);
Manuel doCanto, Stoughton, MA (US);
Shipley Company, L.L.C., Marlborough, MA (US);
Abstract
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.