James L Dale

Title: Innovations of James L. Dale in Semiconductor Technology

Introduction

James L. Dale is a prominent inventor based in Boise, ID (US), known for his significant contributions to semiconductor technology. With a total of 6 patents to his name, Dale has been instrumental in advancing methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Dale's latest patents include innovative methods for forming contact openings in semiconductor assemblies using a disposable hard mask. This method describes how to create self-aligned contacts during the manufacturing of semiconductor devices. By introducing a hard mask material beneath an anti-reflective coating, it serves as an etch stop layer. The multi-layered resist is then patterned and etched to transfer the desired contact pattern to a substrate material, such as silicon, allowing for the formation of contact openings.

Another notable patent involves ion implanting methods. This method includes forming a pair of spaced and adjacent features projecting outwardly from a substrate. The outermost portions of these features are laterally pulled apart while a patterned photoresist layer is applied. This layer has an opening that allows for ion implantation into the substrate material located beneath the features. After the ion implanting process, the patterned photoresist layer is removed, revealing the innovative aspects of this technology.

Career Highlights

James L. Dale is currently associated with Micron Technology Incorporated, a leading company in the semiconductor industry. His work has significantly impacted the development of advanced semiconductor manufacturing techniques.

Collaborations

Dale has collaborated with notable colleagues, including David A. Cathey and John C. Freeman, contributing to various projects that enhance semiconductor technology.

Conclusion

James L. Dale's innovative work in semiconductor technology, particularly in the areas of contact openings and ion implanting methods, showcases his expertise and dedication to advancing the field. His contributions continue to influence the manufacturing processes of semiconductor devices, solidifying his reputation as a leading inventor in this domain.