New Tripoli, PA, United States of America

James Edward MacDougall


Average Co-Inventor Count = 5.1

ph-index = 8

Forward Citations = 302(Granted Patents)


Location History:

  • Emmaus, PA (US) (1994)
  • New Tripoli, PA (US) (1998 - 2009)

Company Filing History:


Years Active: 1994-2009

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17 patents (USPTO):

Title: Innovations of James Edward MacDougall

Introduction

James Edward MacDougall is a notable inventor based in New Tripoli, PA (US). He has made significant contributions to the field of materials science, particularly in the development of low dielectric materials. With a total of 17 patents to his name, MacDougall's work has had a profound impact on the performance of integrated circuits.

Latest Patents

Among his latest patents, MacDougall has developed compositions for preparing low dielectric materials. These materials and films are designed for improved performance in applications such as interlevel dielectrics in integrated circuits. One aspect of this invention focuses on enhancing the dielectric material's performance by controlling the weight percentage of ethylene oxide groups in the porogen. Another significant patent involves aerosol misted deposition of low dielectric organosilicate films. This process aims to produce low dielectric films with a dielectric constant of 3, preferably less than 2.7.

Career Highlights

Throughout his career, MacDougall has worked with prominent companies, including Air Products and Chemicals, Inc. His innovative approaches have led to advancements in the field, making him a respected figure among his peers.

Collaborations

MacDougall has collaborated with notable individuals in his field, including Scott Jeffrey Weigel and Charles G Coe. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

James Edward MacDougall's contributions to the field of low dielectric materials exemplify his innovative spirit and dedication to advancing technology. His patents continue to influence the development of integrated circuits and materials science.

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