The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Jul. 11, 2006
Brian Keith Peterson, Fogelsville, PA (US);
John Francis Kirner, Orefield, PA (US);
Scott Jeffrey Weigel, Allentown, PA (US);
James Edward Macdougall, New Tripoli, PA (US);
Lisa Deis, Legal Representative, Pittsburgh, PA (US);
Thomas Albert Braymer, Allentown, PA (US);
Keith Douglas Campbell, Slatington, PA (US);
Martin Devenney, Mountain View, CA (US);
C. Eric Ramberg, San Jose, CA (US);
Konstantinos Chondroudis, Sunnyvale, CA (US);
Keith Cendak, Millbrae, CA (US);
Brian Keith Peterson, Fogelsville, PA (US);
John Francis Kirner, Orefield, PA (US);
Scott Jeffrey Weigel, Allentown, PA (US);
James Edward MacDougall, New Tripoli, PA (US);
Lisa Deis, legal representative, Pittsburgh, PA (US);
Thomas Albert Braymer, Allentown, PA (US);
Keith Douglas Campbell, Slatington, PA (US);
Martin Devenney, Mountain View, CA (US);
C. Eric Ramberg, San Jose, CA (US);
Konstantinos Chondroudis, Sunnyvale, CA (US);
Keith Cendak, Millbrae, CA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.