Allentown, PA, United States of America

Thomas Albert Braymer

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 1992-2009

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10 patents (USPTO):

Title: **Thomas Albert Braymer: Innovator in Low Dielectric Materials**

Introduction

Thomas Albert Braymer, an influential inventor based in Allentown, PA, has made significant contributions to the field of materials science. With a total of ten patents to his name, Braymer has focused primarily on developing low dielectric materials and their applications in integrated circuits. His innovative ideas have paved the way for more efficient performance materials in various technologies.

Latest Patents

Braymer's recent patent focuses on "Compositions for preparing low dielectric materials." This invention showcases low dielectric materials and films that enhance performance when utilized as interlevel dielectrics in integrated circuits. One of the key aspects of this patent is the ability to improve dielectric material performance by regulating the weight percentage of ethylene oxide groups within at least one porogen.

Career Highlights

Throughout his career, Thomas Albert Braymer has been associated with prominent companies such as Air Products and Chemicals, Inc. and Engelhard Corporation. His work has consistently centered around innovations that enhance material performance, particularly in the electronics sector.

Collaborations

In his professional journey, Braymer has collaborated with esteemed colleagues, including James Edward MacDougall and Charles G Coe. These partnerships have been instrumental in fostering research and refining the advancements in dielectric materials.

Conclusion

Thomas Albert Braymer's contributions to materials science, particularly in low dielectric materials, underscore his role as a crucial innovator in the industry. His patents reflect a commitment to advancing technology, proving that his pioneering work will continue to impact the development of integrated circuits and performance materials for years to come.

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