James B Friedmann

Title: Innovations by Inventor James B. Friedmann

Introduction

James B. Friedmann, based in Dallas, TX, is a notable inventor with a focus on advancing technologies in the semiconductor industry. With a remarkable portfolio of 7 patents, his contributions are pivotal in optimizing manufacturing processes for integrated circuits.

Latest Patents

Among his latest patents, Friedmann has developed a "Method to reduce photoresist poisoning." This innovation involves creating a silicon-rich anti-reflective coating that is exposed to excited oxygen species before the application of a photoresist layer, effectively minimizing the risk of photoresist poisoning. Another significant patent is the "Method for BARC over-etch time adjust with real-time process feedback." This process measures the critical dimension of patterned photoresist and adjusts the over-etch time based on real-time feedback, ensuring precision and consistency in the etching process across multiple wafers.

Career Highlights

Friedmann's professional journey includes his tenure at Texas Instruments Corporation, where his expertise has contributed significantly to the field of semiconductor manufacturing. His inventive approaches are instrumental in addressing the challenges that arise in complex fabrication processes.

Collaborations

Throughout his career, James B. Friedmann has worked alongside talented colleagues such as Shawn T. Walsh and John E. Campbell. These collaborations have nurtured a creative environment conducive to innovation and technological advancements in the industry.

Conclusion

James B. Friedmann's work exemplifies dedication to innovation within the semiconductor sector. His patents not only enhance existing processes but also pave the way for future advancements in the field, showcasing his significant role as an inventor and a thought leader in semiconductor technology.