The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Jun. 11, 2003
James B. Friedmann, Dallas, TX (US);
Christopher C. Baum, Richardson, TX (US);
James B. Friedmann, Dallas, TX (US);
Christopher C. Baum, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method for determining the anti-reflective coating (or bottom anti-reflective coating) over-etch time adjust with real-time process feedback is presented. The critical dimension CDof the patterned photoresist is measured and a first wafer with median values chosen () from a lot. A first time t* is found () and used to form the desired structure. Using the measured critical dimension of the formed structure on the first wafer a second time tis found (). Finally, an over-etch time t(x) is found and used to etch the remaining wafers in the lot ().