The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Sep. 30, 2002
Applicants:
James B. Friedmann, Dallas, TX (US);
Shangting Detweiler, Dallas, TX (US);
Brian M. Trentman, Sherman, TX (US);
Inventors:
James B. Friedmann, Dallas, TX (US);
Shangting Detweiler, Dallas, TX (US);
Brian M. Trentman, Sherman, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); C23C 16/24 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
A silicon rich anti-reflective coating () is formed on a layer () in which narrow linewidth features are to be formed. Prior to the formation of a photoresist layer (), the anti-reflecting coating () is exposed to excited oxygen species to reduce photoresist poisoning.