The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Feb. 04, 2000
Shawn T. Walsh, Richardson, TX (US);
John E. Campbell, Plano, TX (US);
Somit Joshi, Dallas, TX (US);
James B. Friedmann, Dallas, TX (US);
Michael J. McGranaghan, Dallas, TX (US);
Janice D. Makos, McKinney, TX (US);
Arun Sivasothy, Dallas, TX (US);
Troy A. Yocum, Plano, TX (US);
Jaideep Mavoori, Richardson, TX (US);
Wayne A. Bather, Plano, TX (US);
Joe G. Tran, Irving, TX (US);
Ju-Ai Ruan, Plano, TX (US);
Michelle L. Hartsell, Plano, TX (US);
Gregory B. Shinn, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method for forming planar isolation structures for integrated circuits. A etch barrier is formed over the isolation fill material and an etch back is performed to remove material above unetched portions of the substrate. The exposed fill material is etched and planarized to form a planar isolation structure.