Jain-Hon Chen

Title: Jain-Hon Chen: Innovating the Semiconductor Industry

Introduction

Jain-Hon Chen is a prominent inventor known for his groundbreaking work in the semiconductor industry. Based in Chiayi, Taiwan, he holds an impressive portfolio with seven patents to his name, showcasing his contributions to modern semiconductor technology and processes.

Latest Patents

Among his latest innovations, Chen has developed a method to avoid resist poisoning during a damascene process. This invention introduces a semiconductor substrate with a low-k dielectric layer, a SiC layer, and a blocking layer to prevent unpolymerized precursors from contacting an overlying resist. With this method, a bottom anti-reflection coating layer and a resist layer are carefully applied to form a damascene structure in the low-k dielectric layer.

Additionally, he has patented a method for fabricating a shallow trench isolation. This process involves the formation of a pad oxide layer, a silicon oxynitride layer, and a patterned photoresist layer on a substrate. The method effectively creates a shallow trench isolation by utilizing the layers as masks for selective etching.

Career Highlights

Jain-Hon Chen is affiliated with United Microelectronics Corporation, where he has been instrumental in pushing the boundaries of semiconductor manufacturing. His innovative techniques have not only improved production quality but also optimized efficiency in semiconductor processes.

Collaborations

Throughout his career, Chen has had the opportunity to collaborate with esteemed colleagues, including Chi-Fa Ku and Yi-Chun Chang. Together, they engage in innovative projects that contribute significantly to advancements in semiconductor technology.

Conclusion

Jain-Hon Chen's contributions to the semiconductor field exemplify the critical role of innovation in driving progress. Through his patents and collaborations, he continues to inspire future inventions that will shape the industry.