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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Jacob Riseman

USPTO Granted Patents = 34

Average Co-Inventor Count = 1.9

ph-index = 22

Forward Citations = 2,047(Granted Patents)


Company Filing History:

goldMedal34 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1976-1990

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34 patents (USPTO):
1. 4944836 - Chem-mech polishing method for producing coplanar metal/insulator films (1990-07-31),
2. 4729006 - Sidewall spacers for CMOS circuit stress relief/isolation and method for (1988-03-01),
3. 4712125 - Structure for contacting a narrow width PN junction region (1987-12-08),
4. 4689113 - Process for forming planar chip-level wiring (1987-08-25),
5. 4671851 - Method for removing protuberances at the surface of a semiconductor (1987-06-09),
6. 4648937 - Method of preventing asymmetric etching of lines in sub-micrometer range (1987-03-10),
7. 4641170 - Self-aligned lateral bipolar transistors (1987-02-03),
8. 4583106 - Fabrication methods for high performance lateral bipolar transistors (1986-04-15),
9. 4551906 - Method for making self-aligned lateral bipolar transistors (1985-11-12),
10. 4546536 - Fabrication methods for high performance lateral bipolar transistors (1985-10-15),
11. 4544576 - Deep dielectric isolation by fused glass (1985-10-01),
12. 4521952 - Method of making integrated circuits using metal silicide contacts (1985-06-11),
13. 4507171 - Method for contacting a narrow width PN junction region (1985-03-26),
14. 4506435 - Method for forming recessed isolated regions (1985-03-26),
15. 4492717 - Method for forming a planarized integrated circuit (1985-01-08),

Title: Innovator Spotlight: Jacob Riseman - Revolutionizing Semiconductor Technology

Introduction:

Jacob Riseman, a prolific inventor based in Poughkeepsie, NY, has made remarkable contributions to the field of semiconductor technology. With an impressive portfolio of 34 patents, Riseman's innovative approaches have significantly influenced the industry.

Latest Patents:

Among his latest patents is a groundbreaking "Chem-mech Polishing Method for Producing Coplanar Metal/Insulator Films." This technique allows for the precise fabrication of coplanar metal/insulator films on substrates, enhancing the efficiency and reliability of semiconductor devices. Another notable invention is the "Sidewall Spacers for CMOS Circuit Stress Relief/Isolation," which optimizes the manufacturing process of CMOS integrated circuits by improving isolation regions on semiconductors.

Career Highlights:

Riseman's expertise shines through his tenure at IBM, where he has honed his skills and expertise in semiconductor research and development. His relentless pursuit of innovation has led to the successful implementation of novel concepts in the semiconductor industry, positioning him as a trailblazer in the field.

Collaborations:

Throughout his career, Riseman has collaborated with esteemed colleagues such as Irving T Ho and Seiki Ogura. Together, they have worked on cutting-edge projects that have pushed the boundaries of semiconductor technology and paved the way for future advancements in the field.

Conclusion:

Jacob Riseman's inventive spirit and dedication to advancing semiconductor technology have left an indelible mark on the industry. His revolutionary patents and collaborative efforts underscore his commitment to innovation and excellence, cementing his legacy as a pioneering figure in the world of semiconductor research and development.

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