Ja Young Hwang

Title: Ja Young Hwang: Innovator in Anisotropic Conductive Film Technology

Introduction

Ja Young Hwang is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of anisotropic conductive films, holding a total of 7 patents. His work focuses on enhancing the performance and reliability of semiconductor devices through innovative materials and compositions.

Latest Patents

Hwang's latest patents include a composition for anisotropic conductive film and a connection structure utilizing this film. The anisotropic conductive film composition comprises a binder resin, a curable alicyclic epoxy compound, a curable oxetane compound, a quaternary ammonium catalyst, and conductive particles. This film is designed to exhibit a heat quantity variation rate of about 15% or less, as measured by differential scanning calorimetry (DSC). Additionally, he has developed a semiconductor device connected by an anisotropic conductive film, which has a differential scanning calorimeter onset temperature ranging from 60°C to 85°C, and an elastic modulus change of 30% or less.

Career Highlights

Throughout his career, Ja Young Hwang has worked with notable companies such as Samsung SDI Co., Inc. and Cheil Industries Inc. His expertise in materials science and engineering has positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Hwang has collaborated with talented individuals in his field, including Ji Yeon Kim and Kyoung Soo Park. These partnerships have fostered innovation and contributed to the success of his projects.

Conclusion

Ja Young Hwang's contributions to the field of anisotropic conductive films demonstrate his commitment to advancing semiconductor technology. His innovative patents and collaborations highlight his role as a leading inventor in this specialized area.