Hung Chih Chen

Title: Hung Chih Chen: Innovations in Substrate Polishing and Retaining Ring Design

Introduction:

Hung Chih Chen, a resident of Sunnyvale, CA (US), is a prolific inventor with an impressive portfolio of 126 patents. His groundbreaking contributions primarily focus on substrate polishing systems and retaining ring design. Through his work, Chen has made significant advancements in the field of semiconductor manufacturing, enabling improved precision and efficiency in the industry.

Latest Patents:

Chen's latest patents highlight his expertise in substrate polishing and retaining ring technologies. One notable invention is the "Retaining Ring with Shaped Surface and Method of Forming." This patent describes a novel technique for shaping retaining rings by machining or lapping the bottom surface to achieve a desired profile. By incorporating flat, sloped, and curved portions, Chen has enhanced the functionality and adaptability of these vital components.

Another remarkable patent is the "Chemical Mechanical Polishing Apparatus and Methods." This invention introduces a substrate polishing apparatus with multiple zones specifically designed to accommodate different slurry components. Chen's innovative approach optimizes polishing processes by effectively utilizing oxidation, material removal, and corrosion inhibiting slurry components. These advancements contribute to improved substrate polishing outcomes in semiconductor manufacturing.

Career Highlights:

Chen has made substantial contributions to the semiconductor industry through his employment at renowned companies such as Applied Materials, Inc and Applied Materials GmbH. At Applied Materials, Chen had the opportunity to hone his skills and contribute to the development of cutting-edge technologies in the field of semiconductor manufacturing equipment and materials. His inventions have been instrumental in enhancing the efficiency and quality of semiconductor fabrication processes.

Collaborations:

Throughout his career, Chen has collaborated with esteemed colleagues in the industry. Notably, he has worked with Steven M Zuniga and Jeonghoon Oh on various innovative projects. Their combined expertise and shared passion for pushing the boundaries of semiconductor manufacturing have undoubtedly contributed to the success of their collaborative endeavors.

Conclusion:

Hung Chih Chen has established himself as a prominent innovator in the field of semiconductor manufacturing. With an extensive patent portfolio and a focus on substrate polishing systems and retaining ring design, Chen has significantly advanced the industry by introducing novel concepts and refining existing methodologies. His work not only enhances the efficiency and precision of semiconductor fabrication but also underscores the importance of continuous innovation in this dynamic field.