Huayong Hu

Title: Huayong Hu: Innovator in 3D NAND Technology

Introduction

Huayong Hu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of 3D NAND devices. With a total of 12 patents to his name, Huayong Hu continues to push the boundaries of innovation in his field.

Latest Patents

One of Huayong Hu's latest patents is a method for forming a 3D NAND structure. This method includes providing a semiconductor substrate and forming a control gate structure with a plurality of staircase-stacked layers. Each layer has a first end and a second end. The process also involves forming a dielectric layer that covers both the semiconductor substrate and the control gate structure. Additionally, a hard mask layer is formed on the dielectric layer, which is then patterned to create openings above the corresponding second ends of the layers of the control gate structure. The method further includes forming a photoresist layer on the hard mask layer and executing a series of etching processes to create holes with predetermined depths in the dielectric layer. Finally, metal vias are formed in the through holes.

Another notable patent is a patterning apparatus designed to enhance the efficiency of semiconductor manufacturing. This apparatus includes multiple liquid jet units that are configured to jet an anti-etching liquid onto a substrate's surface. It also features exposure units that expose light on the jetted liquid to heat and cure it, forming anti-etching patterns. The control unit of the apparatus manages the motion and jetting status of the liquid jet units, ensuring precise formation of patterns at predetermined line widths and thicknesses.

Career Highlights

Huayong Hu has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Huayong Hu has collaborated with notable professionals in the field, including Qiang Wu and Chang Liu. These collaborations have fostered an environment of innovation and have led to the development of several key technologies in the semiconductor sector.

Conclusion

Huayong Hu is a distinguished inventor whose work in 3D NAND technology and patterning apparatuses has significantly impacted the semiconductor industry. His numerous patents