The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 02, 2012
Huayong HU, Beijing, CN;
Shijian Zhang, Beijing, CN;
Huayong Hu, Beijing, CN;
Shijian Zhang, Beijing, CN;
Abstract
A mask and methods for making the mask and monitoring mask haze using the mask are provided. The mask includes chip areas that are separated by scribe lanes. A scribe lane includes a monitoring area that contains a primary pattern and an associated assist feature. The assist feature includes two parallel scattering bars. Regions in the monitoring area other than the primary pattern and the associated assist feature are covered with a phase shift layer having a transmittance smaller than that of the primary pattern and the assist feature. When the mask is exposed to a light source, the assist feature is not transferred onto a wafer but cooperates with the primary pattern to generate a primary transferred pattern on the wafer. When a region between the two scattering bars has mask haze thereon, a defect identification pattern is generated on the wafer near the primary transferred pattern following exposure.