Suwon, South Korea

Hongseub Kim

This inventor holds 6 USPTO granted patents and 3 published patent applications. Top assignee: Jehara Corporation. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongseub Kim. Retrieved from https://idiyas.com/inventor/hongseub-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 66.7

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Suwon-si, KR (2012 - 2013)
  • Gyeonggi-do, KR (2018 - 2020)

Company Filing History:


Years Active: 2012-2026

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6 patents (USPTO):Explore Patents

Title: Innovations of Hongseub Kim

Introduction

Hongseub Kim is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of surface treatment technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of plasma applications in various industrial processes.

Latest Patents

One of his latest patents is a surface treatment apparatus using plasma. This invention relates to a device designed for cleaning or treating the surface of a Transmission Electron Microscopy (TEM) sample. The apparatus converts plasma ions into a neutral beam, allowing for surface treatment without damaging the sample. Another significant patent is for a plasma generator aimed at improving the uniformity of plasma. This generator includes a pair of source and bias electrode units positioned to face each other within a vacuum chamber, enhancing the overall performance of plasma applications.

Career Highlights

Hongseub Kim is currently associated with Jehara Corporation, where he continues to innovate and develop advanced technologies. His expertise in plasma technology has positioned him as a key figure in the industry, contributing to the advancement of surface treatment methods.

Conclusion

Hongseub Kim's contributions to plasma technology and surface treatment are noteworthy, showcasing his dedication to innovation and excellence in his field. His patents reflect a commitment to improving industrial processes and enhancing the capabilities of existing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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