The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Apr. 14, 2017
Applicant:
Jehara Corporation, Gyeonggi-do, KR;
Inventor:
Hongseub Kim, Gyeonggi-do, KR;
Assignee:
JEHARA CORPORATION, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H05B 31/26 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01J 37/32183 (2013.01); H01J 37/32577 (2013.01);
Abstract
Provided is a plasma generator for improving uniformity of plasma. The plasma generator which includes a pair of source electrode unitand bias electrode unitdisposed to face each other in a vacuum chamber and an RF power unitand a bias RF power unitsupplying RF power to the source electrode unitand the bias electrode unit, respectively, comprises a common contact point cc which is connected with a plurality of contact points cp disposed along the edge of the source electrode unit; and an impedance controllerwhich is connected with the common contact point cc to control the impedance.