The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Jul. 20, 2017
Applicant:
Jehara Corporation, Gyeonggi-do, KR;
Inventor:
Hongseub Kim, Gyeonggi-do, KR;
Assignee:
Jehara Corporation, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01J 37/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/026 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32834 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/334 (2013.01);
Abstract
The present invention relates to a surface treatment apparatus for cleaning or treating (micro etching, etc.) a surface of a TEM sample (substrate) by converting plasma ions into a neutral beam and a separator including an RF cathode connected to an RF supply unit and accelerating ions by self bias is disposed between a plasma generating chamber and a neutral chamber and the ions generated in the plasma generating chamber are converted into a neutral beam through a separator and accelerated and irradiated to a neutral chamber to enable surface treatment without damaging a sample.