The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Jul. 11, 2024
Jehara Corporation, Suwon-si, KR;
Hongseub Kim, Hwaseong-si, KR;
JEHARA CORPORATION, Suwon-si, KR;
Abstract
A plasma generator and a method of using the same are proposed. The disclosed relates to a plasma generator and a method of using the same capable of improving the uniformity of plasma used in a semiconductor manufacturing process and forming fine patterns and patterns having a high aspect ratio by precisely controlling ion energy. The plasma generator includes a vacuum chamber, a source electrode provided in the vacuum chamber, a bias electrode provided to correspond to the source electrode in the vacuum chamber and on which a substrate seated thereon, a shower head unit provided on a lower part of the source electrode to supply reaction gas to a plasma space above the substrate, an RF power supply unit for applying RF power to the source electrode, and a bias power supply unit connected to the bias electrode to apply bias power.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile