Taipei, Taiwan

Hong-Shyang Wu

USPTO Granted Patents = 11 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Taipei City, TW (2018)
  • Taipei, TW (2021 - 2024)

Company Filing History:


Years Active: 2018-2025

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11 patents (USPTO):

Title: Innovations of Hong-Shyang Wu

Introduction

Hong-Shyang Wu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced transistor designs that enhance performance and efficiency in electronic devices.

Latest Patents

Among his latest patents is the "Cascaded bipolar junction transistor and methods of forming the same." This invention describes a device that includes a substrate with a first bipolar junction transistor (BJT) and a second BJT, both designed to improve electrical performance. The interconnect structure of the device allows for efficient electrical connections between the BJTs, enhancing overall functionality.

Another notable patent is the "GAA LDMOS structure for HV operation." This invention features a gate-all-around (GAA) high voltage transistor that utilizes a loop-shaped gate electrode. This innovative design allows for a significant reduction in pitch and an increase in linear drive current compared to traditional asymmetric NMOS transistors.

Career Highlights

Hong-Shyang Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in transistor design has positioned him as a key figure in the industry.

Collaborations

He has collaborated with Kuo-Ming Wu, contributing to advancements in semiconductor technology through their joint efforts.

Conclusion

Hong-Shyang Wu's innovative work in the field of semiconductors has led to significant advancements in transistor technology. His patents reflect a commitment to improving electronic device performance and efficiency.

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